Optical Document Security Conference 2018,
San Francisco, USA,  24-26 January 2018

Oral Presentation by Markus Koch, SECTAGO GmbH
A Transparent OVD Based on the Combination of Novel Origination Technology with Wet Index Coatings

A transparent DOVID based on a mask-less lithographic origination process is described. All gratings are individually generated at highly variable parameter settings regarding pitch, depth, contour and vector orientation, resulting in unique optical feature characteristics at optimized diffraction efficiencies. For transmission viewing more than four times the gratings’ depth of reflective devices had to be realized without loss in high spatial resolution. Sealing of the gratings was well achieved by wet coating of HRI or LRI polymers. Technical details will be presented and samples will demonstrate the great potential for transparent OVD applications in documents.

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